Agency:National Aeronautics and Space Administration
Beatmark x
Agency Tracking Number:154807

Beat Mark's profile including the latest music, albums, songs, music videos and more updates. In fact one of the greatest potential of BeatMark 2 is the possibility to cut the music directly inside the app, all the cuts and changes will be exactly the same inside Final Cut Pro X. There are these two new icons that allow you to make cuts (the blade in Final Cut Pro X), and delete a clip. The BeatMark X Control Panel By clicking on the “Preferences” button in the main window, you can set BeatMark X settings. Algorithm Allows you to set which algorithm to use to find the markers. MS algorithm This is the basic algorithm, and is perfect for all songs whose tempo remains constant throughout the song. BeatMark cracked is a very popular music for Mac The marker program allows you to generate timed music markers that can be used in Final Cut Pro X. It is easy to use, just drag the file with the song into the “Drag Here Music File” area, and then press “BeatMark”: the application will analyze the audio file and generate a mark. BeatMark X produces an.FCPXML file in the same folder of the song and you can import in Final Cut Pro X the song and the markers placed in exact correspondence with the music beats. Just drag the song that you want to analyze, set the number of frames per second for the project that you want to create, and then press the “BeatMark X” button.

Www.bestmark.com
Phase:Phase II
Solicitation Number:N/A
Award Year:2016
Award End Date (Contract End Date):2018-05-09
Needham, MA02494-1306
United States
Woman Owned:Yes
Name: Anastasia Tyurina
Title: CEO and Principal Investigator
Phone: (781) 400-1323
Email: atyurina@sipan.org

Beatmaker Free

Name: Michael McComas
Title: Proposal Manager
Phone: (603) 860-6016
Email: mmccomas@alum.mit.edu

For X-Ray optics, polishing the mirrors is one of the most costly steps in the fabrication of the system. BeatMark software will significantly decrease the cost of X-Ray mirror production. BeatMark will allow for parametrization of surface metrology data, which will be used as feedback for polishing parameter optimization and metrology experiment planning. By providing the parametrized optical surface description, BeatMark will optimize the costly polishing-and metrology cycle and enable numerical simulation of the performance of new X-Ray mirrors performed by NASA. BeatMark will help fulfill the requirements for sophisticated and reliable information about the expected surface slope and height distributions of prospective X-Ray optics before the optics are fabricated. As we demonstrated in Phase I, an optical surface can be thought of as a stationary uniform stochastic process and modeled with optimal Invertible Time Invariant Filters (InTILF). It was further shown that the modeling of one-dimensional (1D) slope measurements allows highly confident fitting of the X-Ray mirror metrology data with a limited number of parameters and a 10-15% reduction of required length of metrology profiles. Theoretically, a reduction of 50% is possible. In Phase II, we will conduct field tests to assess what reduction in metrology is practical and implementable. With the parameters of the InTILF model developed in Phase I, the surface slope profile of optics with a new specification can be forecast reliably. BeatMark will also process 2-D metrology data and provide a polishing optimization method, based on analysis of the mirror quality response to the polishing parameters. Our Phase I studies indicated that the optimal InTILF modeling describes the mirror surfaces with very few filter parameters and high spectral accuracy.

Beatmark 2

* Information listed above is at the time of submission. *